Millipore Applications Bibliography |
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| Title: | Ultrapure Water for Boron and Silica Sensitive Laboratory Applications | |
| Author/s: | Darbouret D, Kano I | |
| Reference: | American Laboratory News January 2000;12-16 | |
| Affiliation: | Millipore Corporation | |
| Address: | Millipore SA, Rue Jacques Monod, St.Quentin, FRANCE | |
| Description: | Research paper | |
| Water System: | Elix Analytical - Grade Water Systems, Milli-Q Ultrapure Water Systems, Milli-Q Ultrapure Water Systems |
Summary/Comments:
Weakly charged elements or elements that are not well dissociated in water, are not removed efficiently by conventional water purification technologies. In the production of high purity water, silica and boron are generally the first ions to breakthrough into purified water when the ion-exchange resin approaches depletion. In this study, the behavior of these two elements is studied through various steps in a water purification chain. An optimized system configuration is proposed that combines reverse osmosis and electrodeionization technologies in the pretreatment phase, and results in the efficient removal of boron and silica. These initial purification steps produce high resistivity water, presenting a low ionic challenge to ultrapure polishing resins. In addition, a specific chelating adsorbent enhances the retention capacity of boron. Typical values achieved for the most important parameters assessed while producing ultrapure water, are described. A water purification system producing ultrapure water suitable for trace analyses down to ppt levels, including boron sensitive laboratory applications, can be achieved providing specific system design and configuration are respected.
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