Product Reference
Ultrapure Water for Boron- and Silica-Sensitive Laboratory Applications
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| Author |
Darbouret D, Kano I; Millipore R&D Notebook No. RD003 |
| Citation Information |
American Laboratory, 32:12-16 (2000) |
| Keywords |
WaterlineClubReference, ICP-MS, TOC, Elix, Milli-Q, r&d notebook, rd003, rd003en00, feed water, potable, fouling, TOC, Ultrapure Water for Boron- and Silica-Sensitive Applications |
| Applications |
Organics-TOC/DOC |
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When performing trace analysis, two parameters are vital in order to attain the best
possible quantification limits: the experimental environment and the reagents used, including the ultrapure water used to perform blanks, dilute standards, and wash glassware. However, weakly ionized ions, such as boron and silica, do not impact resistivity measurement. Water quality is thus affected without the user being aware of it. Specific developments to re-duce the breakthrough of these weakly bound ions are proposed. Additional research is under way to improve the sensitivity of silica determinations and
the purification of trace levels of silica in ultrapure water. The water purification chain described in this paper ensures constant minimal elemental contamination.
The EDI module shows good ionic balance for extended periods of time without the need for resin regeneration. The combination of reverse osmosis and electrodeionization shows good efficiency and stability of ionic reduction. In the final water purification unit, early boron breakthrough from ion exchange resin is eliminated by using a special adsorption device. As a result, the combination of these technologies can provide ultrapure water suitable for ppt
and sub-ppt trace elemental analysis.